| Optical Coatings Laboratory |
Optical coating facility
In order to achieve desired optical performance of optics single layer or multilayer coating of alternate high and low refractive index layers are required. For this three deposition facilities are currently being used; ion-assisted e-beam evaporation and sputter deposition.
The ion-assisted e-beam deposition is a fully automatic system. It consists of two independent e-beam guns (each 10 kW , 4x15 cc crucibles, sweep etc.), one broad beam ion source (40 – 210 eV, 0 – 7 A, gases: O2 & Ar), planetary substrate rotation ( 4 x 100 mm dia. substrates), in-situ optical and physical thickness monitoring, etc.
Photograph of ion-assisted electron beam deposition
The sputter deposition system is in-house developed. It consists of two tiltable sputter cathodes in confocal geometry, simple substrate rotation (1 x 150 mm dia. Substrate), in-situ physical thickness monitoring, substrate heating and cooling, DC, RF, Pulsed DC sputtering, ion assisted cleaning and deposition etc.
Photograph of sputter deposition
The dual ion beam sputter deposition facility is equipped with two ion sources; one for sputtering from a target and the other for cleaning, oxidation and densification of films. Four oxide targets are used to grow multilayer oxide coatings. Four substrates, each 150 mm dia. can be accommodated and are rotated in a planetary configuration. In-situ optical and physical thickness monitoring are done during deposition.
Photograph of Dual ion beam sputtering deposition
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